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Hunan Jingtan Automation Equipment Co., LTD.
Hunan Jingtan Automation Equipment Co., LTD.
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Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size

Λεπτομέρειες για το προϊόν

Τόπος καταγωγής: Κίνα

Μάρκα: Jingtan

Πιστοποίηση: CE

Όροι πληρωμής και αποστολής

Ποσότητα παραγγελίας min: 1 Σετ

Τιμή: USD10,000-80,000/SET

Συσκευασία λεπτομέρειες: ξύλινη θήκη

Χρόνος παράδοσης: 60 ημέρες

Όροι πληρωμής: Ε/Κ/Τ/τ

Δυνατότητα προσφοράς: 5pcs/μήνα

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Επισημαίνω:

1500°C Working Temperature Sintering Furnace

,

±5°C Temperature Uniformity Si2O Sintering Furnace

,

Customizable Chamber Size Silicon Oxide Sintering Furnace

Μέγεθος φούρνων:
Προσαρμόσιμο
Θερμοκρασία εργασίας:
1500 ° C
Ομοιομορφία θερμοκρασίας:
±5°C
Μέγεθος θαλάμου:
Προσαρμοσμένο
Εγγύηση:
1 Έτος
Σύστημα ψύξης:
Υδροψύξη
Κατάσταση:
Νέος
Μέγεθος φούρνων:
Προσαρμόσιμο
Θερμοκρασία εργασίας:
1500 ° C
Ομοιομορφία θερμοκρασίας:
±5°C
Μέγεθος θαλάμου:
Προσαρμοσμένο
Εγγύηση:
1 Έτος
Σύστημα ψύξης:
Υδροψύξη
Κατάσταση:
Νέος
Περιγραφή
Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size

 

 

Suitable for mass production of vapor deposition materials such as silicon oxide; High precision temperature difference control, high temperature and high vacuum; With high vacuum sublimation, reaction, degreasing, dehydration, vapor deposition material automatic grinding scraping, furnace collection and other special process capabilities.

 

Equipment features:

 

A large amount of material, high production efficiency.

l The whole process is completely closed and automatic operation, avoid dust flying, the production site environment is clean and clean.

l Temperature control within 1500 degrees, fast heating rate.

l can maintain stable operation under vacuum.

 

Equipment parameters:

 

l Furnace type is horizontal structure.

l Equipment is composed of sublimation system, collection system, heating system, temperature control system, vacuum system, mechanical system and cooling system.

The sublimation system is composed of a heating zone and a collection zone. The heating zone is composed of induction coil, heavy corundum, graphite hard felt and isostatic graphite. The collection area is composed of 310S stainless steel and insulation layer.

l Temperature control system adopts PLC touch screen centralized control mode, automatic control, with network port, can realize remote control.

l The heating system adopts induction heating, and the power supply adopts IGBT energy saving power with low noise and about 15% energy saving compared with the traditional thyristor power supply.

The vacuum system consists of multistage vacuum pump, vacuum valve, pressure controller and pipeline.

l The furnace body is made of double-layer water cooling structure inside and outside, and the part in contact with the cooling water is made of 304 stainless steel, which effectively prevents the furnace body from leaking gas for a long time.

l The cooling system is equipped with a closed cooling system. The internal circulation uses deionized water, which will not cause scaling in the equipment pipeline. The internal circulation water loss is small. Good heat dissipation effect, integrated environmental protection, small footprint and so on.

l The size of the constant temperature zone: Φ500mm*600mm, Φ600mm*800mm, Φ700mm*1000mm, Φ800mm*1600mm and so on. (can be customized according to customer needs)

 

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 0

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 1

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 2

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 3

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 4

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 5

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 6

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 7

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 8

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 9

Si2O Sintering Furnace for Silicon Oxide with 1500°C Working Temperature, ±5°C Uniformity & Customizable Chamber Size 10

 

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